In the organiser's words
What the official page says.
Quoted from fotocreativaba.com and checked on 1 September 2026. This is the organiser's description, reproduced as captured. It has not been through the evidence checks that produced the figures above.
The Expanded Photography Research Residency is a hybrid international program organized by FotoCreativaBA in collaboration with IDEA R LAB (directed by Hiroko Ohtsuki in Kurashiki, Japan). The platform connects expanded photography, visual observation, material processes, local contexts, and global cultural exchange. The programming is structured into three distinct phases: Phase 1 (12-Month Online Laboratory): Shifting away from heavy weekly screen time, this phase prioritizes autonomous processes, deep reading, and monthly theoretical/creative triggers linking contemporary expanded photography with Japanese aesthetics (e.g., Wabi-Sabi, Kintsugi, the Ma interval, and the Provoke movement).
It includes monthly 1-on-1 curatorial reviews, collective critiques, and guest lectures. Phase 2 (1-Month On-Site Residency): Fieldwork at IDEA R LAB focused on studio work, site-specific research, and material investigation using local industrial waste. Phase 3 (Closing & Public Presentation): Final project reviews, open studios, process-based exhibitions, or activations both online and at the FotoCreativaBA gallery.
The program is explicitly conceived as a space for exploration, learning, and transcultural dialogue rather than a purely production-oriented residency.
- Duration
The complete hybrid program lasts 13 months in total. This includes a 12-month online laboratory (March 2027 – February 2028), followed by a 1-month on-site stay in Kurashiki, Japan. Artists can choose their preferred month for the in-person phase from three available slots in 2028: March, April, or May (with 3 artists hosted per month, totaling 9 artists).
- Accommodation
Artists receive full accommodation during their 1-month on-site stay in Japan, to ensure a comfortable stay while interacting with the residency peers and the local community.
- Disciplines & equipment
Eligible Disciplines: Open to visual artists, contemporary photographers, and researchers from anywhere in the world interested in expanded photography, material processes, and transcultural dialogue. The program is fully bilingual (Spanish/English friendly). Work Equipment & Resources: Artists have access to specialized workspaces and a unique framework for creative reuse. This includes access to local industrial waste materials and discarded objects to be used as creative media, alongside guidance on collecting, documenting, and conceptually reinterpreting these elements.
Assistance & Mentorship: The program provides continuous curatorial training. This includes monthly 1-on-1 curatorial feedback and mentorship sessions with Program Director Natheim, as well as on-site coordination, local integration, and expert facilitation by Hiroko Ohtsuki in Japan.
- Studio
Artists have full access to the dedicated studio facilities and workspaces at IDEA R LAB. The workspace is shared among the 3 artists in residence each month, fostering a collaborative learning environment. It is designed to support material experimentation, site-specific research, and direct dialogue with the local environment and the Kurashiki community.
- Fees & support
As a self-funded international platform, the residency relies on a program fee with the following structure: Fee Range / Investment: An initial enrollment fee of USD 360 (payable only upon acceptance to secure the spot), followed by an installment plan of 12 monthly payments of USD 240 during the online phase. What is included: 12 months of specialized online curatorial training and regular feedback, specialized seminars, use of shared studio facilities, community living support, Wi-Fi, full on-site accommodation in Japan (room, linens, breakfast, and dinner), and a formal exhibition opportunity to showcase work at the FotoCreativaBA gallery in Buenos Aires, Argentina. What is NOT included: Airfare to Japan, personal expenses, and personal art materials.